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By Dr Chukwuka Madumelu

Preprints

Madumelu C; Cai Y; Hollemann C; Peibst R; Hoex B; Hallam B; Soeriyadi A, 2022, Assessing the Stability of P+ and N+ Polysilicon Passivating Contacts with Various Capping Layers on P-Type Wafers, http://dx.doi.org/10.2139/ssrn.4289694


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orcid_icon https://orcid.org/0000-0002-0359-7194

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