By Professor Bram Hoex

Conference Papers

Hoex B; Peeters FJJ; Van Erven AJM; Bijker MD; Kessels WMM; Van De Sanden MCM, 2006, 'High-quality surface passivation obtained by high-rate deposited silicon nitride, silicon dioxide and amorphous silicon using the versatile expanding thermal plasma technique', in Conference Record of the 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion Wcpec 4, pp. 1036 - 1039, http://dx.doi.org/10.1109/WCPEC.2006.279296

Van De Sanden MCM; Creatore M; Blauw MA; Hoefnagels JPM; Hoex B; Van Den Oever PJ; Smets AHM; Schram DC; Kessels WMM, 2005, 'Expanding thermal plasma CVD: Experimental studies of the plasma-surface interaction', in Proceedings Electrochemical Society, pp. 36 - 48

Kessels WMM; Van Den Oever PJ; Hoex B; Bosch RCM; Van Erven AJM; Bijker MD; Van De Sanden MCM, 2005, 'Controlling the silicon nitride film dENSfTY for ultrahigh-rate deposition of top quality antireflection coatings', in Conference Record of the IEEE Photovoltaic Specialists Conference, pp. 1253 - 1256

Van Den Oever PJ; Kessels WMM; Hoex B; Bosch RCM; Van Erven AJM; Pennings RLJR; Stals WTM; Bijker MD; Van De Sanden MCM, 2005, 'Plasma properties of a novel commercial plasma source for high-throughput processing of c-Si solar cells', in Conference Record of the IEEE Photovoltaic Specialists Conference, pp. 1320 - 1323

Aarts IMP; Hoex B; Gielis JJH; Leewis CM; Smets AHM; Engeln R; Nesládek M; Kessels WMM; Van de Sanden MCM, 2003, 'Thin film cavity ringdown spectroscopy and second harmonic generation on thin a-Si:H films', in Materials Research Society Symposium Proceedings, pp. 111 - 116, http://dx.doi.org/10.1557/proc-762-a19.8

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