ORCID as entered in ROS
![orcid_icon](/themes/resgate8/images/icons/ORCIDiD_icon24x24.png)
Select Publications
2018, 'Influence of dielectric passivation layer thickness on LeTID in multicrystalline silicon', Hawaii, USA, Vol. 00, pp. 363 - 367, presented at WCPEC-7, Hawaii, USA, 10 June 2018 - 15 June 2018, http://dx.doi.org/10.1109/PVSC.2018.8547618
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