Select Publications
Conference Papers
1990, 'TEM STUDIES OF CD-ZN-TE-BASED II-VI SUPERLATTICES AND EPITAXIAL LAYERS', in KATZ A; BIEFELD RM; GUNSHOR RL; MALIK RJ (eds.), LONG-WAVELENGTH SEMICONDUCTOR DEVICES, MATERIALS, AND PROCESSES, MATERIALS RESEARCH SOC, MA, BOSTON, pp. 427 - 432, presented at SYMP ON LONG-WAVELENGTH SEMICONDUCTOR DEVICES, MATERIALS, AND PROCESSES, MA, BOSTON, 26 November 1990 - 29 November 1990, https://www.webofscience.com/api/gateway?GWVersion=2&SrcApp=PARTNER_APP&SrcAuth=LinksAMR&KeyUT=WOS:A1991BT83A00059&DestLinkType=FullRecord&DestApp=ALL_WOS&UsrCustomerID=891bb5ab6ba270e68a29b250adbe88d1
,Patents
2022, A method for selective incorporation of dopant atoms in a semiconductive surface, Patent No. United States - 11227768
,2021, Advanced processing apparatus, Patent No. Australian 2021 pat no.2015252051
,2019, A Quantum Processor, Patent No. Australia patent no. 2015252050; Switzerland patent no. 3016034; Germany patent no. 602015048909.8; Spain patent no. E15192761; France patent no. 3016034; United Kingdom patent no. 3016034; Ireland patent no. 3016034; Netherlands patent no. 3016034, https://worldwide.espacenet.com/publicationDetails/biblio?II=1&ND=3&adjacent=true&locale=en_EP&FT=D&date=20160519&CC=AU&NR=2015252050A1&KC=A1
,2019, A method of fabricating a three dimensional electronic structure, Patent No. United States patent no. 10373914; Australia patent no. 2017203949, http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO1&Sect2=HITOFF&d=PALL&p=1&u=%2Fnetahtml%2FPTO%2Fsrchnum.htm&r=1&f=G&l=50&s1=10373914.PN.&OS=PN/10373914&RS=PN/10373914
,2019, Apparatus and method for quantum processing, Patent No. 10229365, http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO1&Sect2=HITOFF&d=PALL&p=1&u=%2Fnetahtml%2FPTO%2Fsrchnum.htm&r=1&f=G&l=50&s1=10229365.PN.&OS=PN/10229365&RS=PN/10229365
,2018, Fabricating nanoscale and atomic scale devices, Patent No. 1660403, https://worldwide.espacenet.com/publicationDetails/biblio?CC=EP&NR=1660403B1&KC=B1&FT=D&ND=&date=20181010&DB=EPODOC&locale=en_EP#
,2017, FABRICATION OF ATOMIC SCALE DEVICES, Belgium, Patent No. 2250124, https://worldwide.espacenet.com/publicationDetails/biblio?CC=EP&NR=2250124B1&KC=B1&FT=D#
,2017, Fabrication of Atomic Scale Devices, France, Patent No. 2250124, https://worldwide.espacenet.com/publicationDetails/biblio?CC=EP&NR=2250124B1&KC=B1&FT=D#
,2017, Fabrication of Atomic Scale Devices, Netherlands, Patent No. 2250124, https://worldwide.espacenet.com/publicationDetails/biblio?CC=EP&NR=2250124B1&KC=B1&FT=D#
,2017, Fabrication of Atomic Scale Devices, United Kingdom, Patent No. 2250124, https://worldwide.espacenet.com/publicationDetails/biblio?CC=EP&NR=2250124B1&KC=B1&FT=D#
,2011, Fabricating nanoscale and atomic scale devices, Japan, Patent No. 4855255, Patent Agent:Qucor Pty Ltd
,2002, Single molecule array on silicon substrate for quantum computer, Patent No.
,2000, A process for the fabrication of a quantum computer, Patent No.
,Preprints
2023, Impact of measurement backaction on nuclear spin qubits in silicon, , http://dx.doi.org/10.48550/arxiv.2310.12656
,2023, Superexchange coupling of donor qubits in silicon, , http://dx.doi.org/10.48550/arxiv.2309.00276
,2022, 3-Dimensional Tuning of an Atomically Defined Silicon Tunnel Junction, , http://dx.doi.org/10.48550/arxiv.2211.02180
,2022, Optimisation of electrically-driven multi-donor quantum dot qubits, , http://dx.doi.org/10.48550/arxiv.2203.16553
,2022, Single-shot readout of multiple donor electron spins with a gate-based sensor, , http://dx.doi.org/10.48550/arxiv.2203.09248
,2021, Valley population of donor states in highly strained silicon, , http://dx.doi.org/10.48550/arxiv.2109.08540
,2021, Valley interference and spin exchange at the atomic scale in silicon, , http://dx.doi.org/10.48550/arxiv.2105.10931
,2021, Flopping-mode electric dipole spin resonance in phosphorus donor qubits in silicon, , http://dx.doi.org/10.48550/arxiv.2105.02906
,2018, Benchmarking high fidelity single-shot readout of semiconductor qubits, , http://dx.doi.org/10.48550/arxiv.1811.03630
,2018, Engineering long spin coherence times of spin-orbit systems, , http://dx.doi.org/10.48550/arxiv.1809.10859
,2018, Single-shot single-gate RF spin readout in silicon, , http://dx.doi.org/10.48550/arxiv.1809.01802
,2018, Addressable electron spin resonance using donors and donor molecules in silicon, , http://dx.doi.org/10.48550/arxiv.1807.10290
,2018, High Fidelity Single-Shot Singlet-Triplet Readout of Precision Placed Donors in Silicon, , http://dx.doi.org/10.48550/arxiv.1807.10285
,2018, Singlet-triplet minus mixing and relaxation lifetimes in a double donor dot, , http://dx.doi.org/10.48550/arxiv.1807.10289
,2018, Two-Electron Spin Correlations in Precision Placed Donors in Silicon, , http://dx.doi.org/10.48550/arxiv.1807.10295
,2017, Tunneling statistics for analysis of spin-readout fidelity, , http://dx.doi.org/10.48550/arxiv.1710.02243
,2017, Valley filtering and spatial maps of coupling between silicon donors and quantum dots, , http://dx.doi.org/10.48550/arxiv.1706.09261
,2017, Two-electron states of a group V donor in silicon from atomistic full configuration interaction, , http://dx.doi.org/10.48550/arxiv.1703.04175
,2017, Spin-orbit dynamics of single acceptor atoms in silicon, , http://dx.doi.org/10.48550/arxiv.1703.03538
,2017, Probing the Quantum States of a Single Atom Transistor at Microwave Frequencies, , http://dx.doi.org/10.48550/arxiv.1702.08569
,2016, Mapping the Chemical Potential Landscape of a Triple Quantum Dot, , http://dx.doi.org/10.48550/arxiv.1609.03381
,2016, Characterizing Si:P quantum dot qubits with spin resonance techniques, , http://dx.doi.org/10.48550/arxiv.1607.01086
,2016, Extracting inter-dot tunnel couplings between few donor quantum dots in silicon, , http://dx.doi.org/10.48550/arxiv.1606.00851
,2016, Manifestation of a non-abelian gauge field in a p-type semiconductor system, , http://dx.doi.org/10.48550/arxiv.1604.06149
,2016, Resonant tunneling spectroscopy of valley eigenstates on a hybrid double quantum dot, , http://dx.doi.org/10.48550/arxiv.1604.04020
,2016, Spatial Metrology of Dopants in Silicon with Exact Lattice Site Precision, , http://dx.doi.org/10.48550/arxiv.1601.02326
,2015, The impact of nuclear spin dynamics on electron transport through donors, , http://dx.doi.org/10.48550/arxiv.1509.05407
,2015, Radio frequency reflectometry and charge sensing of a precision placed donor in silicon, , http://dx.doi.org/10.48550/arxiv.1509.03315
,2015, Engineering inter-qubit exchange coupling between donor bound electrons in silicon, , http://dx.doi.org/10.48550/arxiv.1507.08009
,2015, Quantum Simulation of the Hubbard Model with Dopant Atoms in Silicon, , http://dx.doi.org/10.48550/arxiv.1507.06125
,2015, Strain and Electric Field Control of Hyperfine Interactions for Donor Spin Qubits in Silicon, , http://dx.doi.org/10.48550/arxiv.1504.06370
,2015, Bottom-up assembly of metallic germanium, , http://dx.doi.org/10.48550/arxiv.1503.05994
,2015, Interface-induced heavy-hole/light-hole splitting of acceptors in silicon, , http://dx.doi.org/10.48550/arxiv.1501.05669
,2015, Spin-lattice relaxation times of single donors and donor clusters in silicon, , http://dx.doi.org/10.48550/arxiv.1501.04089
,2014, Spontaneous breaking of time reversal symmetry in strongly interacting two dimensional electron layers in silicon and germanium, , http://dx.doi.org/10.48550/arxiv.1404.0625
,2014, Single-charge detection by an atomic precision tunnel junction, , http://dx.doi.org/10.48550/arxiv.1403.5320
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