By Scientia Professor Michelle Yvonne Simmons

Patents

Simmons M; Keizer J, 2022, A method for selective incorporation of dopant atoms in a semiconductive surface, Patent No. United States - 11227768

Simmons M; Hollenberg L; Rogge S; Hile S; House M; Fuechsle M; Peretz E; Hill C, 2021, Advanced processing apparatus, Patent No. Australian 2021 pat no.2015252051

Simmons M; Hollenberg L; Hill C; Peretz E; Hile S; Fuechsle M; Rogge S, 2019, A Quantum Processor, Patent No. Australia patent no. 2015252050; Switzerland patent no. 3016034; Germany patent no. 602015048909.8; Spain patent no. E15192761; France patent no. 3016034; United Kingdom patent no. 3016034; Ireland patent no. 3016034; Netherlands patent no. 3016034, https://worldwide.espacenet.com/publicationDetails/biblio?II=1&ND=3&adjacent=true&locale=en_EP&FT=D&date=20160519&CC=AU&NR=2015252050A1&KC=A1

Simmons M; Keizer J; Koch M, 2019, A method of fabricating a three dimensional electronic structure, Patent No. United States patent no. 10373914; Australia patent no. 2017203949, http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO1&Sect2=HITOFF&d=PALL&p=1&u=%2Fnetahtml%2FPTO%2Fsrchnum.htm&r=1&f=G&l=50&s1=10373914.PN.&OS=PN/10373914&RS=PN/10373914

Simmons M; Hollenberg L; Rogge S; Hile S; House M; Fuechsle M; Peretz E; Hill C, 2019, Apparatus and method for quantum processing, Patent No. 10229365, http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO1&Sect2=HITOFF&d=PALL&p=1&u=%2Fnetahtml%2FPTO%2Fsrchnum.htm&r=1&f=G&l=50&s1=10229365.PN.&OS=PN/10229365&RS=PN/10229365

Ruess F; Oberbeck L; Simmons M; Goh J; Hamilton A; Mitic M; Brenner R; Curson J; Hallam T, 2018, Fabricating nanoscale and atomic scale devices, Patent No. 1660403, https://worldwide.espacenet.com/publicationDetails/biblio?CC=EP&NR=1660403B1&KC=B1&FT=D&ND=&date=20181010&DB=EPODOC&locale=en_EP#

Simmons MY; Fuhrer A; Fuechsle M; Weber B; Reusch T; Pok W; Ruess F, 2017, FABRICATION OF ATOMIC SCALE DEVICES, Belgium, Patent No. 2250124, https://worldwide.espacenet.com/publicationDetails/biblio?CC=EP&NR=2250124B1&KC=B1&FT=D#

Simmons MY; Fuhrer A; Fuechsle M; Weber B; Reusch T; Pok W; Ruess F, 2017, Fabrication of Atomic Scale Devices, France, Patent No. 2250124, https://worldwide.espacenet.com/publicationDetails/biblio?CC=EP&NR=2250124B1&KC=B1&FT=D#

Simmons MY; Fuhrer A; Fuechsle M; Weber B; Reusch T; Pok W; Ruess F, 2017, Fabrication of Atomic Scale Devices, Netherlands, Patent No. 2250124, https://worldwide.espacenet.com/publicationDetails/biblio?CC=EP&NR=2250124B1&KC=B1&FT=D#

Simmons MY; Fuhrer A; Fuechsle M; Weber B; Reusch T; Pok W; Ruess F, 2017, Fabrication of Atomic Scale Devices, United Kingdom, Patent No. 2250124, https://worldwide.espacenet.com/publicationDetails/biblio?CC=EP&NR=2250124B1&KC=B1&FT=D#

Simmons MY, 2011, Fabricating nanoscale and atomic scale devices, Japan, Patent No. 4855255, Patent Agent:Qucor Pty Ltd

Clark RG; Dzurak A; O Brien J; Schofield SR; Simmons MY, 2002, Single molecule array on silicon substrate for quantum computer, Patent No.

Clark RG; Curson NJ; Dzurak A; O Brien J; Schofield S; Simmons MY, 2000, A process for the fabrication of a quantum computer, Patent No.

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